| | Specification |
| Wavelength range | 190 to 700 nm |
| Bandwidth | <5 nm |
| Wavelength accuracy | +1.0 nm |
| Wavelength repeatability | +0.1 nm |
| Single λ dry noise | <5 µAU
(at 230 nm, 1 –second digital filter, 30-second segments, 10-Hz data rate, analytical cell) |
| Wet noise | <8 µAU
(at 230 nm, 1-second digital filter 30-second segments, 10-Hz data rate, analytical cell) |
| Dual channel noise (dry) | <35 µAU
(measured at 230 nm, running at 230 to 280 nm with 2-second filter at 1-Hz data rate; dry, analytical cell) |
| Dual channel noise (wet) | <45 µAU
(measured at 230 nm, running at 230 to 280 nm with 2-second filter at 1-Hz data rate; 1 ml/min, flow of acetonitrile, analytical cell) |
| Linearity | <5% at 2.5 AU, propylparaben at 257 nm |
| Drift | 1.0 x 10-4 AU/hr. max (∆T = +2°C/hr.) |
| Thermal drift | 1.0 x 10-4 AU/°C max (∆T = +2°C/hr.) |
| Sensitivity setting range | 0.0001 to 4.0000 AUFS |
| Filter setting range | Single-wavelength: 0.1 to 5.0 seconds
Dual-wavelength: 1 to 50 seconds |
| Time-constant | To 5.0-second Hamming filter |
| Digital data rates | 1,2,5,10,20,40,80 Hz (single channel)
1,2 Hz (dual channel) |
| Analog output data rates (single λ mode) | 10,20,40,80 Hz (channel A)
10 Hz only (channel B) |
| Lamp source | 30-W High Brightness Deuterium lamp, 0.5 nm aperture, pre-aligned 2000 silicon photodiodes (matched pair) |
| Second-order filter | Automatic for wavelengths > 370 nm |
| Wavelength calibration filter | Erbium filter, used at startup or on demand |
| Flow cell | TaperSlit flow cell design |
| Nitrogen purge | Purge fitting present on optics bench |
| Path length | 10 mm (standard analytical) |
| Cell volume | 10 µL (standard analytical) |
| Pressure limit | 6895 kPa (69 bar,1000 psi) |
| Materials | 316 stainless steel, fused silica, Tygon |
| Operating temperature | 4 to 40 °C (39 to 104 °F) |
| Operating humidity | 20% to <95%, noncondensing |
| Shipping and storage | -30 to +60 °C |
| Shipping and storage humidity | 0% to <95% noncondensing |