New Wave 532nm green laser
Mitutoyo FS60 microscope, 2/10/20/50x APO objectives
Stand with XY stage including 2 micrometers
Applications:
semiconductor and failure analysis
removal of topside passivation and dielectric layers including SiO2, Nitride, Polyimide, SOG, Poly-silicon, gold, aluminum, Ti-Tungsten
resistor trimming
Specifications:
0.6mj
6ns pulse width
Single shot 532nm (green) laser with a 5hz burst mode
spot marker with adjustable aperture for sizing cuts from a maximum of 50 microns square (with 50x objective) down to 1 micron square (with 100x objective)
High and low power range
New Wave 532nm green laser
Mitutoyo FS60 microscope, 2/10/20/50x APO objectives
Stand with XY stage including 2 micrometers
Applications:
semiconductor and failure analysis
removal of topside passivation and dielectric layers including SiO2, Nitride, Polyimide, SOG, Poly-silicon, gold, aluminum, Ti-Tungsten
resistor trimming
Specifications:
0.6mj
6ns pulse width
Single shot 532nm (green) laser with a 5hz burst mode
spot marker with adjustable aperture for sizing cuts from a maximum of 50 microns square (with 50x objective) down to 1 micron square (with 100x objective)
High and low power range